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6.152J Microelectronics Processing Technology (MIT) 6.152J Microelectronics Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | microelectronics | Microelectronics processing | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits | integrated circuits | vacuum | vacuum | chemical vapor deposition | chemical vapor deposition | CVD | CVD | oxidation | oxidation | diffusion | diffusion | implantation | implantation | lithography | lithography | soft lithography | soft lithography | etching | etching | sputtering | sputtering | evaporation | evaporation | interconnect | interconnect | metallization | metallization | crystal growth | crystal growth | reliability | reliability | fabrication | fabrication | processing | processing | photolithography | photolithography | physical vapor deposition | physical vapor deposition | MOS | MOS | MOS capacitor | MOS capacitor | microcantilever | microcantilever | microfluidic | microfluidic | 6.152 | 6.152 | 3.155 | 3.155

License

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6.774 Physics of Microfabrication: Front End Processing (MIT) 6.774 Physics of Microfabrication: Front End Processing (MIT)

Description

Includes audio/video content: AV lectures. This course is offered to graduates and focuses on understanding the fundamental principles of the "front-end" processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new materials such as Silicon Germanium (SiGe). Includes audio/video content: AV lectures. This course is offered to graduates and focuses on understanding the fundamental principles of the "front-end" processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new materials such as Silicon Germanium (SiGe).

Subjects

fabrication processes | fabrication processes | silicon | silicon | integrated circuits | integrated circuits | monolithic integrated circuits | monolithic integrated circuits | physical models | physical models | bulk crystal growth | bulk crystal growth | thermal oxidation | thermal oxidation | solid-state diffusion | solid-state diffusion | ion implantation | ion implantation | epitaxial deposition | epitaxial deposition | chemical vapor deposition | chemical vapor deposition | physical vapor deposition | physical vapor deposition | refractory metal silicides | refractory metal silicides | plasma and reactive ion etching | plasma and reactive ion etching | rapid thermal processing | rapid thermal processing | process modeling | process modeling | process simulation | process simulation | technological limitations | technological limitations | integrated circuit design | integrated circuit design | integrated circuit fabrication | integrated circuit fabrication | device operation | device operation | sige materials | sige materials | processing | processing

License

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6.152J Microelectronics Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | 6.152 | 3.155

License

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6.152J Micro/Nano Processing Technology (MIT) 6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | microelectronics | Microelectronics processing | Microelectronics processing | integrated circuits | integrated circuits | vacuum | vacuum | chemical vapor deposition | chemical vapor deposition | CVD | CVD | oxidation | oxidation | diffusion | diffusion | implantation | implantation | lithography | lithography | soft lithography | soft lithography | etching | etching | sputtering | sputtering | evaporation | evaporation | interconnect | interconnect | metallization | metallization | crystal growth | crystal growth | reliability | reliability | fabrication | fabrication | processing | processing | photolithography | photolithography | physical vapor deposition | physical vapor deposition | MOS | MOS | MOS capacitor | MOS capacitor | microcantilever | microcantilever | microfluidic. | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.973 Organic Optoelectronics (MIT) 6.973 Organic Optoelectronics (MIT)

Description

The course examines optical and electronic processes in organic molecules and polymers that govern the behavior of practical organic optoelectronic devices. Electronic structure of a single organic molecule is used as a guide to the electronic behavior of organic aggregate structures. Emphasis is placed on the use of organic thin films in active organic devices including organic LEDs, solar cells, photodetectors, transistors, chemical sensors, memory cells, electrochromic devices, as well as xerography and organic non-linear optics. How to reach the ultimate miniaturization limit of molecular electronics and related nanoscale patterning techniques of organic materials will also be discussed. The class encompasses three laboratory sessions during which the students will practice the use of The course examines optical and electronic processes in organic molecules and polymers that govern the behavior of practical organic optoelectronic devices. Electronic structure of a single organic molecule is used as a guide to the electronic behavior of organic aggregate structures. Emphasis is placed on the use of organic thin films in active organic devices including organic LEDs, solar cells, photodetectors, transistors, chemical sensors, memory cells, electrochromic devices, as well as xerography and organic non-linear optics. How to reach the ultimate miniaturization limit of molecular electronics and related nanoscale patterning techniques of organic materials will also be discussed. The class encompasses three laboratory sessions during which the students will practice the use of

Subjects

organic optoelectronics | organic optoelectronics | optical | optical | electronic | electronic | polymers | polymers | organic thin films | organic thin films | organic LEDs | organic LEDs | solar cells | solar cells | photodetectors | photodetectors | transistors | transistors | chemical sensors | chemical sensors | memory cells | memory cells | electrochromic devices | electrochromic devices | xerography | xerography | organic non-linear optics | organic non-linear optics | miniaturization limit | miniaturization limit | molecular electronics | molecular electronics | nanoscale patterning | nanoscale patterning | vacuum organic deposition | vacuum organic deposition | non-vacuum organic deposition | non-vacuum organic deposition

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.774 Physics of Microfabrication: Front End Processing (MIT)

Description

This course is offered to graduates and focuses on understanding the fundamental principles of the "front-end" processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new materials such as Silicon Germanium (SiGe).

Subjects

fabrication processes | silicon | integrated circuits | monolithic integrated circuits | physical models | bulk crystal growth | thermal oxidation | solid-state diffusion | ion implantation | epitaxial deposition | chemical vapor deposition | physical vapor deposition | refractory metal silicides | plasma and reactive ion etching | rapid thermal processing | process modeling | process simulation | technological limitations | integrated circuit design | integrated circuit fabrication | device operation | sige materials | processing

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

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6.774 Physics of Microfabrication: Front End Processing (MIT)

Description

This course is offered to graduates and focuses on understanding the fundamental principles of the "front-end" processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new materials such as Silicon Germanium (SiGe).

Subjects

fabrication processes | silicon | integrated circuits | monolithic integrated circuits | physical models | bulk crystal growth | thermal oxidation | solid-state diffusion | ion implantation | epitaxial deposition | chemical vapor deposition | physical vapor deposition | refractory metal silicides | plasma and reactive ion etching | rapid thermal processing | process modeling | process simulation | technological limitations | integrated circuit design | integrated circuit fabrication | device operation | sige materials | processing

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

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22.01 Introduction to Ionizing Radiation (MIT) 22.01 Introduction to Ionizing Radiation (MIT)

Description

This course is an introduction to basic properties of ionizing radiations and their uses in medicine, industry, science, and environmental studies. Discusses natural and man-made radiation sources, energy deposition and dose calculations, various physical, chemical, and biological processes and effects of radiation with examples of their uses, and principles of radiation protection. Term paper and oral presentation of paper required.This course was originally developed by Dr. Jacquelyn Yanch.  As such, significant portions of the materials presented here were derived from her work. This course is an introduction to basic properties of ionizing radiations and their uses in medicine, industry, science, and environmental studies. Discusses natural and man-made radiation sources, energy deposition and dose calculations, various physical, chemical, and biological processes and effects of radiation with examples of their uses, and principles of radiation protection. Term paper and oral presentation of paper required.This course was originally developed by Dr. Jacquelyn Yanch.  As such, significant portions of the materials presented here were derived from her work.

Subjects

ionizing radiations | ionizing radiations | radiation sources | radiation sources | energy deposition | energy deposition | dose calculations | dose calculations | principles of radiation protection | principles of radiation protection | ionizing | ionizing | radiation | radiation | medicine | medicine | industry | industry | science | science | environmental studies | environmental studies | natural radiation sources | natural radiation sources | man-made radiation | man-made radiation | radiation protection | radiation protection | material interaction | material interaction | biological material | biological material | radiation therapy | radiation therapy | medical imaging | medical imaging | non-destructive evaluation | non-destructive evaluation | food irradiation | food irradiation | radionuclide dating | radionuclide dating | well-logging | well-logging

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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3.46 Photonic Materials and Devices (MIT) 3.46 Photonic Materials and Devices (MIT)

Description

This course covers the theory, design, fabrication and applications of photonic materials and devices. After a survey of optical materials design for semiconductors, dielectrics and polymers, the course examines ray optics, electromagnetic optics and guided wave optics; physics of light-matter interactions; and device design principles of LEDs, lasers, photodetectors, modulators, fiber and waveguide interconnects, optical filters, and photonic crystals. Device processing topics include crystal growth, substrate engineering, thin film deposition, etching and process integration for dielectric, silicon and compound semiconductor materials. The course also covers microphotonic integrated circuits and applications in telecom/datacom systems. Course assignments includ This course covers the theory, design, fabrication and applications of photonic materials and devices. After a survey of optical materials design for semiconductors, dielectrics and polymers, the course examines ray optics, electromagnetic optics and guided wave optics; physics of light-matter interactions; and device design principles of LEDs, lasers, photodetectors, modulators, fiber and waveguide interconnects, optical filters, and photonic crystals. Device processing topics include crystal growth, substrate engineering, thin film deposition, etching and process integration for dielectric, silicon and compound semiconductor materials. The course also covers microphotonic integrated circuits and applications in telecom/datacom systems. Course assignments includ

Subjects

Optical materials design | Optical materials design | Ray optics | Ray optics | electromagnetic optics | electromagnetic optics | guided wave optics | guided wave optics | light-matter interactions | light-matter interactions | LED | LED | laser | laser | photodetector | photodetector | modulator | modulator | interconnect | interconnect | optical filter | optical filter | photonic crystals | photonic crystals | crystal growth | crystal growth | substrate engineering | substrate engineering | thin film deposition | thin film deposition | microphotonic integrated circuits | microphotonic integrated circuits | telecom and datacom systems | telecom and datacom systems

License

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3.042 Materials Project Laboratory (MIT) 3.042 Materials Project Laboratory (MIT)

Description

As its name implies, the 3.042 Materials Project Laboratory involves working with such operations as investment casting of metals, injection molding of polymers, and sintering of ceramics. After all the abstraction and theory in the lecture part of the DMSE curriculum, many students have found this hands-on experience with materials to be very fun stuff - several have said that 3.042/3.082 was their favorite DMSE subject. The lab is more than operating processing equipment, however. It is intended also to emulate professional practice in materials engineering project management, with aspects of design, analysis, teamwork, literature and patent searching, Web creation and oral presentation, and more. As its name implies, the 3.042 Materials Project Laboratory involves working with such operations as investment casting of metals, injection molding of polymers, and sintering of ceramics. After all the abstraction and theory in the lecture part of the DMSE curriculum, many students have found this hands-on experience with materials to be very fun stuff - several have said that 3.042/3.082 was their favorite DMSE subject. The lab is more than operating processing equipment, however. It is intended also to emulate professional practice in materials engineering project management, with aspects of design, analysis, teamwork, literature and patent searching, Web creation and oral presentation, and more.

Subjects

Student project teams design and fabricate a materials engineering prototype using processing technologies (injection molding | Student project teams design and fabricate a materials engineering prototype using processing technologies (injection molding | thermoforming | thermoforming | investment casting | investment casting | powder processing | powder processing | three-dimensional printing | three-dimensional printing | physical vapor deposition | physical vapor deposition | etc.) appropriate for the materials and device of interest. Goals include using MSE fundamentals in a practical application; understanding trade-offs between design | etc.) appropriate for the materials and device of interest. Goals include using MSE fundamentals in a practical application; understanding trade-offs between design | processing and performance; and fabrication of a deliverable prototype. Emphasis on teamwork | processing and performance; and fabrication of a deliverable prototype. Emphasis on teamwork | project management | project management | communications and computer skills | communications and computer skills | and hands-on work using student and MIT laboratory shops. Teams document their progress and final results by means of web pages and weekly oral presentations. Instruction and practice in oral communication provided. | and hands-on work using student and MIT laboratory shops. Teams document their progress and final results by means of web pages and weekly oral presentations. Instruction and practice in oral communication provided.

License

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3.46 Photonic Materials and Devices (MIT) 3.46 Photonic Materials and Devices (MIT)

Description

This course covers the theory, design, fabrication and applications of photonic materials and devices. After a survey of optical materials design for semiconductors, dielectrics and polymers, the course examines ray optics, electromagnetic optics and guided wave optics; physics of light-matter interactions; and device design principles of LEDs, lasers, photodetectors, modulators, fiber and waveguide interconnects, optical filters, and photonic crystals. Device processing topics include crystal growth, substrate engineering, thin film deposition, etching and process integration for dielectric, silicon and compound semiconductor materials. The course also covers microphotonic integrated circuits and applications in telecom/datacom systems. Course assignments include four design projects that This course covers the theory, design, fabrication and applications of photonic materials and devices. After a survey of optical materials design for semiconductors, dielectrics and polymers, the course examines ray optics, electromagnetic optics and guided wave optics; physics of light-matter interactions; and device design principles of LEDs, lasers, photodetectors, modulators, fiber and waveguide interconnects, optical filters, and photonic crystals. Device processing topics include crystal growth, substrate engineering, thin film deposition, etching and process integration for dielectric, silicon and compound semiconductor materials. The course also covers microphotonic integrated circuits and applications in telecom/datacom systems. Course assignments include four design projects that

Subjects

Optical materials design | Optical materials design | Ray optics | Ray optics | electromagnetic optics | electromagnetic optics | guided wave optics | guided wave optics | light-matter interactions | light-matter interactions | LED | LED | laser | laser | photodetector | photodetector | modulator | modulator | interconnect | interconnect | optical filter | optical filter | photonic crystals | photonic crystals | crystal growth | crystal growth | substrate engineering | substrate engineering | thin film deposition | thin film deposition | microphotonic integrated circuits | microphotonic integrated circuits | telecom and datacom systems | telecom and datacom systems

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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12.110 Sedimentary Geology (MIT) 12.110 Sedimentary Geology (MIT)

Description

Survey of the important aspects of modern sediments and ancient sedimentary rocks. Emphasis is on fundamental materials, features, and processes. Textures of siliciclastic sediments and sedimentary rocks: particle size, particle shape, and particle packing. Mechanics of sediment transport. Survey of siliciclastic sedimentary rocks: sandstones, conglomerates, and shales. Carbonate sediments and sedimentary rocks; cherts; evaporites. Siliciclastic and carbonate diagenesis. Paleontology, with special reference to fossils in sedimentary rocks. Modern and ancient depositional environments. Stratigraphy. Sedimentary basins. Fossil fuels: coal, petroleum. Survey of the important aspects of modern sediments and ancient sedimentary rocks. Emphasis is on fundamental materials, features, and processes. Textures of siliciclastic sediments and sedimentary rocks: particle size, particle shape, and particle packing. Mechanics of sediment transport. Survey of siliciclastic sedimentary rocks: sandstones, conglomerates, and shales. Carbonate sediments and sedimentary rocks; cherts; evaporites. Siliciclastic and carbonate diagenesis. Paleontology, with special reference to fossils in sedimentary rocks. Modern and ancient depositional environments. Stratigraphy. Sedimentary basins. Fossil fuels: coal, petroleum.

Subjects

sediments | sediments | sedimentary rocks | sedimentary rocks | siliciclastic rocks | siliciclastic rocks | sediment transport | sediment transport | sandstones | sandstones | conglomerates | conglomerates | shales | shales | carbonate rocks | carbonate rocks | cherts | cherts | evaporites | evaporites | paleontology | paleontology | depositional environments | depositional environments | stratigraphy | stratigraphy | sedimentary basins | sedimentary basins | fossil fuels | fossil fuels | coal | coal | petroleum. | petroleum.

License

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22.01 Introduction to Ionizing Radiation (MIT) 22.01 Introduction to Ionizing Radiation (MIT)

Description

This course provides an introduction to the basic properties of ionizing radiations and their uses in medicine, industry, science, and environmental studies. We will discuss natural and man-made radiation sources, energy deposition and dose calculations, and various physical, chemical, and biological processes and effects of radiation, with examples of their uses, and principles of radiation protection. This course provides an introduction to the basic properties of ionizing radiations and their uses in medicine, industry, science, and environmental studies. We will discuss natural and man-made radiation sources, energy deposition and dose calculations, and various physical, chemical, and biological processes and effects of radiation, with examples of their uses, and principles of radiation protection.

Subjects

ionizing radiation | ionizing radiation | natural radiation | natural radiation | man-made radiation | man-made radiation | energy deposition | energy deposition | dose calculations | dose calculations | radiation protection | radiation protection | radiation damage | radiation damage | DNA | DNA | cell survival curves | cell survival curves | radioactive decay | radioactive decay | beta decay | beta decay | gamma decay | gamma decay | radiological dating | radiological dating | radiation interactions | radiation interactions | radon | radon | medical imaging | medical imaging

License

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6.973 Organic Optoelectronics (MIT)

Description

The course examines optical and electronic processes in organic molecules and polymers that govern the behavior of practical organic optoelectronic devices. Electronic structure of a single organic molecule is used as a guide to the electronic behavior of organic aggregate structures. Emphasis is placed on the use of organic thin films in active organic devices including organic LEDs, solar cells, photodetectors, transistors, chemical sensors, memory cells, electrochromic devices, as well as xerography and organic non-linear optics. How to reach the ultimate miniaturization limit of molecular electronics and related nanoscale patterning techniques of organic materials will also be discussed. The class encompasses three laboratory sessions during which the students will practice the use of

Subjects

organic optoelectronics | optical | electronic | polymers | organic thin films | organic LEDs | solar cells | photodetectors | transistors | chemical sensors | memory cells | electrochromic devices | xerography | organic non-linear optics | miniaturization limit | molecular electronics | nanoscale patterning | vacuum organic deposition | non-vacuum organic deposition

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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22.01 Introduction to Ionizing Radiation (MIT) 22.01 Introduction to Ionizing Radiation (MIT)

Description

This course provides an introduction to the basic properties of ionizing radiations and their uses in medicine, industry, science, and environmental studies. We will discuss natural and man-made radiation sources, energy deposition and dose calculations, and various physical, chemical, and biological processes and effects of radiation, with examples of their uses, and principles of radiation protection. This course provides an introduction to the basic properties of ionizing radiations and their uses in medicine, industry, science, and environmental studies. We will discuss natural and man-made radiation sources, energy deposition and dose calculations, and various physical, chemical, and biological processes and effects of radiation, with examples of their uses, and principles of radiation protection.

Subjects

ionizing radiation | ionizing radiation | natural radiation | natural radiation | man-made radiation | man-made radiation | energy deposition | energy deposition | dose calculations | dose calculations | radiation protection | radiation protection | radiation damage | radiation damage | DNA | DNA | cell survival curves | cell survival curves | radioactive decay | radioactive decay | beta decay | beta decay | gamma decay | gamma decay | radiological dating | radiological dating | radiation interactions | radiation interactions | radon | radon | medical imaging | medical imaging

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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