Searching for metal : 2007 results found | RSS Feed for this search

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80

6.152J Microelectronics Processing Technology (MIT) 6.152J Microelectronics Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | microelectronics | Microelectronics processing | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits | integrated circuits | vacuum | vacuum | chemical vapor deposition | chemical vapor deposition | CVD | CVD | oxidation | oxidation | diffusion | diffusion | implantation | implantation | lithography | lithography | soft lithography | soft lithography | etching | etching | sputtering | sputtering | evaporation | evaporation | interconnect | interconnect | metallization | metallization | crystal growth | crystal growth | reliability | reliability | fabrication | fabrication | processing | processing | photolithography | photolithography | physical vapor deposition | physical vapor deposition | MOS | MOS | MOS capacitor | MOS capacitor | microcantilever | microcantilever | microfluidic | microfluidic | 6.152 | 6.152 | 3.155 | 3.155

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

5.04 Principles of Inorganic Chemistry II (MIT) 5.04 Principles of Inorganic Chemistry II (MIT)

Description

This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. The electronic structure of molecules will be developed. Against this backdrop, the optical, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy is described. This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. The electronic structure of molecules will be developed. Against this backdrop, the optical, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy is described.

Subjects

inorganic chemistry | inorganic chemistry | group theory | group theory | transition metal complexes | transition metal complexes | symmetry element | symmetry element | point group | point group | LCAO | LCAO | metal metal bonding | metal metal bonding | vibrational spectroscopy | vibrational spectroscopy | character tables | character tables | sandwich compounds | sandwich compounds

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.152J Microelectronics Processing Technology (MIT) 6.152J Microelectronics Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | microelectronics | Microelectronics processing | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits | integrated circuits | vacuum | vacuum | chemical vapor deposition | chemical vapor deposition | CVD | CVD | oxidation | oxidation | diffusion | diffusion | implantation | implantation | lithography | lithography | soft lithography | soft lithography | etching | etching | sputtering | sputtering | evaporation | evaporation | interconnect | interconnect | metallization | metallization | crystal growth | crystal growth | reliability | reliability | fabrication | fabrication | processing | processing | photolithography | photolithography | physical vapor deposition | physical vapor deposition | MOS | MOS | MOS capacitor | MOS capacitor | microcantilever | microcantilever | microfluidic | microfluidic | 6.152 | 6.152 | 3.155 | 3.155

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

5.04 Principles of Inorganic Chemistry II (MIT) 5.04 Principles of Inorganic Chemistry II (MIT)

Description

This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. The electronic structure of molecules will be developed. Against this backdrop, the optical, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy is described. This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. The electronic structure of molecules will be developed. Against this backdrop, the optical, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy is described.

Subjects

inorganic chemistry | inorganic chemistry | group theory | group theory | transition metal complexes | transition metal complexes | symmetry element | symmetry element | point group | point group | LCAO | LCAO | metal metal bonding | metal metal bonding | vibrational spectroscopy | vibrational spectroscopy | character tables | character tables | sandwich compounds | sandwich compounds

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

Techniques for Studying Materials: Microstructural Examination Techniques for Studying Materials: Microstructural Examination

Description

This set of animations consists of interactive phase diagrams of Fe-C, grey cast iron, white cast iron, alpha brass and alpha-beta brass. From TLP: Microstructural Examination This set of animations consists of interactive phase diagrams of Fe-C, grey cast iron, white cast iron, alpha brass and alpha-beta brass. From TLP: Microstructural Examination

Subjects

micrograph | micrograph | microstructure | microstructure | metallography | metallography | metallographic | metallographic | phase diagram | phase diagram | phase transformation | phase transformation | eutectic | eutectic | eutectoid | eutectoid | peritectic | peritectic | steel | steel | martensite | martensite | ferrite | ferrite | cementite | cementite | austenite | austenite | pearlite | pearlite | cast iron | cast iron | spheroidal cast iron | spheroidal cast iron | grey cast iron | grey cast iron | white cast iron | white cast iron | brass | brass | alpha brass | alpha brass | alpha beta brass | alpha beta brass | DoITPoMS | DoITPoMS | University of Cambridge | University of Cambridge | animation | animation | corematerials | corematerials | ukoer | ukoer

License

http://creativecommons.org/licenses/by-nc-sa/2.0/uk/

Site sourced from

http://core.materials.ac.uk/rss/doitpoms_animations.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

Collecting scrap at Hetton Station Goods Yard Collecting scrap at Hetton Station Goods Yard

Description

Subjects

road | road | roof | roof | sky | sky | abstract | abstract | blur | blur | industry | industry | wheel | wheel | metal | metal | stone | stone | wall | wall | shirt | shirt | yard | yard | standing | standing | fence | fence | buildings | buildings | 1974 | 1974 | interesting | interesting | workers | workers | industrial | industrial | carriage | carriage | unitedkingdom | unitedkingdom | path | path | timber | timber | mark | mark | coat | coat | debris | debris | caps | caps | grain | grain | plate | plate | ground | ground | social | social | number | number | soil | soil | cap | cap | transportation | transportation | signage | signage | bolt | bolt | archives | archives | land | land | letter | letter | vehicle | vehicle | trousers | trousers | unusual | unusual | telegraphpole | telegraphpole | scrap | scrap | railways | railways | crease | crease | flap | flap | attentive | attentive | slope | slope | collecting | collecting | numberplate | numberplate | fascinating | fascinating | digitalimage | digitalimage | sunderland | sunderland | scrapmetal | scrapmetal | citycouncil | citycouncil | 1895 | 1895 | blackandwhitephotograph | blackandwhitephotograph | northeastofengland | northeastofengland | goodsyard | goodsyard | moorsley | moorsley | mid20thcentury | mid20thcentury | eastrainton | eastrainton | hettonlehole | hettonlehole | easingtonlane | easingtonlane | hettondowns | hettondowns | hettonurbandistrictcouncil | hettonurbandistrictcouncil | hettonstationgoodsyard | hettonstationgoodsyard | hettonleholeurbandistrict | hettonleholeurbandistrict | sunderlandmetropolitanborough | sunderlandmetropolitanborough | localgovernmentact1894 | localgovernmentact1894

License

No known copyright restrictions

Site sourced from

http://api.flickr.com/services/feeds/photos_public.gne?id=29295370@N07&lang=en-us&format=rss_200

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

3.094 Materials in Human Experience (MIT) 3.094 Materials in Human Experience (MIT)

Description

This course examines the ways in which people in ancient and contemporary societies have selected, evaluated, and used materials of nature, transforming them to objects of material culture. Some examples are: glass in ancient Egypt and Rome; sounds and colors of powerful metals in Mesoamerica; cloth and fiber technologies in the Inca empire. It also explores ideological and aesthetic criteria often influential in materials development. Laboratory/workshop sessions provide hands-on experience with materials discussed in class. This course complements 3.091. This course examines the ways in which people in ancient and contemporary societies have selected, evaluated, and used materials of nature, transforming them to objects of material culture. Some examples are: glass in ancient Egypt and Rome; sounds and colors of powerful metals in Mesoamerica; cloth and fiber technologies in the Inca empire. It also explores ideological and aesthetic criteria often influential in materials development. Laboratory/workshop sessions provide hands-on experience with materials discussed in class. This course complements 3.091.

Subjects

ancient and contemporary societies | ancient and contemporary societies | materials of nature | materials of nature | objects of material culture | objects of material culture | glass | glass | ancient Egypt and Rome | ancient Egypt and Rome | metals | metals | Mesoamerica | Mesoamerica | cloth and fiber technologies | cloth and fiber technologies | the Inca empire | the Inca empire | ideological and aesthetic criteria | ideological and aesthetic criteria | materials development | materials development | ancient glass | ancient glass | ancient Andean metallurgy | ancient Andean metallurgy | rubber processing | rubber processing | materials processing | materials processing | materials engineering | materials engineering | pre-modern technology | pre-modern technology | ceramics | ceramics | fibers | fibers | ideology | ideology | values | values | anthropology | anthropology | archaeology | archaeology | history | history | culture | culture

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

8.511 Theory of Solids I (MIT) 8.511 Theory of Solids I (MIT)

Description

This is the first term of a theoretical treatment of the physics of solids. Topics covered include crystal structure and band theory, density functional theory, a survey of properties of metals and semiconductors, quantum Hall effect, phonons, electron phonon interaction and superconductivity. This is the first term of a theoretical treatment of the physics of solids. Topics covered include crystal structure and band theory, density functional theory, a survey of properties of metals and semiconductors, quantum Hall effect, phonons, electron phonon interaction and superconductivity.

Subjects

physics of solids | physics of solids | elementary excitations | elementary excitations | symmetry | symmetry | theory of representations | theory of representations | energy bands | energy bands | excitons | excitons | critical points | critical points | response functions | response functions | interactions in the electron gas | interactions in the electron gas | electronic structure of metals | semimetals | electronic structure of metals | semimetals | semiconductors | semiconductors | insulators | insulators | Free electron model | Free electron model | Crystalline lattice | Crystalline lattice | Debye Waller factor | Debye Waller factor | Bravais lattice | Bravais lattice | Pseudopotential | Pseudopotential | van Hove singularity | van Hove singularity | Bloch oscillation | Bloch oscillation | quantization of orbits | quantization of orbits | de Haas-van Alphen effect | de Haas-van Alphen effect | Quantum Hall effect | Quantum Hall effect | Electron-electron interaction | Electron-electron interaction | Hartree-Fock approximation | Hartree-Fock approximation | Exchange energy for Jellium | Exchange energy for Jellium | Density functional theory | Density functional theory | Hubbard model | Hubbard model | Electron-phonon coupling | Electron-phonon coupling | phonons | phonons

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allsimplifiedchinesecourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

3.094 Materials in Human Experience (MIT) 3.094 Materials in Human Experience (MIT)

Description

This course examines the ways in which people in ancient and contemporary societies have selected, evaluated, and used materials of nature, transforming them to objects of material culture. Some examples are: glass in ancient Egypt and Rome; sounds and colors of powerful metals in Mesoamerica; cloth and fiber technologies in the Inca empire. It also explores ideological and aesthetic criteria often influential in materials development. Laboratory/workshop sessions provide hands-on experience with materials discussed in class. This course complements 3.091. This course examines the ways in which people in ancient and contemporary societies have selected, evaluated, and used materials of nature, transforming them to objects of material culture. Some examples are: glass in ancient Egypt and Rome; sounds and colors of powerful metals in Mesoamerica; cloth and fiber technologies in the Inca empire. It also explores ideological and aesthetic criteria often influential in materials development. Laboratory/workshop sessions provide hands-on experience with materials discussed in class. This course complements 3.091.

Subjects

ancient and contemporary societies | ancient and contemporary societies | materials of nature | materials of nature | objects of material culture | objects of material culture | glass | glass | ancient Egypt and Rome | ancient Egypt and Rome | metals | metals | Mesoamerica | Mesoamerica | cloth and fiber technologies | cloth and fiber technologies | the Inca empire | the Inca empire | ideological and aesthetic criteria | ideological and aesthetic criteria | materials development | materials development | ancient glass | ancient glass | ancient Andean metallurgy | ancient Andean metallurgy | rubber processing | rubber processing | materials processing | materials processing | materials engineering | materials engineering | pre-modern technology | pre-modern technology | ceramics | ceramics | fibers | fibers | ideology | ideology | values | values | anthropology | anthropology | archaeology | archaeology | history | history | culture | culture

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allsimplifiedchinesecourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

3.094 Materials in Human Experience (MIT) 3.094 Materials in Human Experience (MIT)

Description

This course examines the ways in which people in ancient and contemporary societies have selected, evaluated, and used materials of nature, transforming them to objects of material culture. Some examples are: glass in ancient Egypt and Rome; sounds and colors of powerful metals in Mesoamerica; cloth and fiber technologies in the Inca empire. It also explores ideological and aesthetic criteria often influential in materials development. Laboratory/workshop sessions provide hands-on experience with materials discussed in class. This course complements 3.091. This course examines the ways in which people in ancient and contemporary societies have selected, evaluated, and used materials of nature, transforming them to objects of material culture. Some examples are: glass in ancient Egypt and Rome; sounds and colors of powerful metals in Mesoamerica; cloth and fiber technologies in the Inca empire. It also explores ideological and aesthetic criteria often influential in materials development. Laboratory/workshop sessions provide hands-on experience with materials discussed in class. This course complements 3.091.

Subjects

ancient and contemporary societies | ancient and contemporary societies | materials of nature | materials of nature | objects of material culture | objects of material culture | glass | glass | ancient Egypt and Rome | ancient Egypt and Rome | metals | metals | Mesoamerica | Mesoamerica | cloth and fiber technologies | cloth and fiber technologies | the Inca empire | the Inca empire | ideological and aesthetic criteria | ideological and aesthetic criteria | materials development | materials development | ancient glass | ancient glass | ancient Andean metallurgy | ancient Andean metallurgy | rubber processing | rubber processing | materials processing | materials processing | materials engineering | materials engineering | pre-modern technology | pre-modern technology | ceramics | ceramics | fibers | fibers | ideology | ideology | values | values | anthropology | anthropology | archaeology | archaeology | history | history | culture | culture

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses-3.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

3.40J Physical Metallurgy (MIT) 3.40J Physical Metallurgy (MIT)

Description

Discusses structure-property relationships in metallic alloys selected to illustrate some basic concepts of physical metallurgy and alloy design. Fundamentals of annealing, spinodal decomposition, nucleation, growth, and particle coarsening. Concentrates on structure, structure formation, and structure-properties relationships. Also considers structural features: grain size, interstitial and substitutional solutes, precipitates, second-phase particles, and eutectoids. Examples from advanced structural alloys and low-dimensional alloys for magnetic recording media and integrated circuits. Discusses structure-property relationships in metallic alloys selected to illustrate some basic concepts of physical metallurgy and alloy design. Fundamentals of annealing, spinodal decomposition, nucleation, growth, and particle coarsening. Concentrates on structure, structure formation, and structure-properties relationships. Also considers structural features: grain size, interstitial and substitutional solutes, precipitates, second-phase particles, and eutectoids. Examples from advanced structural alloys and low-dimensional alloys for magnetic recording media and integrated circuits.

Subjects

metallic alloys | metallic alloys | physical metallurgy | physical metallurgy | alloy design | alloy design | annealing | annealing | spinodal decomposition | spinodal decomposition | nucleation | nucleation | particle coarsening | particle coarsening | structure | structure | structure formation | structure formation | structure-properties relationships | structure-properties relationships | structural features | structural features | 3.40 | 3.40 | 22.71 | 22.71

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

5.04 Principles of Inorganic Chemistry II (MIT) 5.04 Principles of Inorganic Chemistry II (MIT)

Description

This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. Against the backdrop of electronic structure, the electronic, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy described. This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. Against the backdrop of electronic structure, the electronic, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy described.

Subjects

inorganic chemistry | inorganic chemistry | group theory | group theory | electronic structure of molecules | electronic structure of molecules | transition metal complexes | transition metal complexes | spectroscopy | spectroscopy | symmetry elements | symmetry elements | mathematical groups | mathematical groups | character tables | character tables | molecular point groups | molecular point groups | Huckel Theory | Huckel Theory | N-Dimensional cyclic systems | N-Dimensional cyclic systems | solid state theory | solid state theory | band theory | band theory | frontier molecular orbitals | frontier molecular orbitals | similarity transformations | similarity transformations | complexes | complexes | organometallic complexes | organometallic complexes | two electron bond | two electron bond | vibrational spectroscopy | vibrational spectroscopy | symmetry | symmetry | overtones | overtones | normal coordinat analysis | normal coordinat analysis | AOM | AOM | single electron CFT | single electron CFT | tanabe-sugano diagram | tanabe-sugano diagram | ligand | ligand | crystal field theory | crystal field theory | LCAO | LCAO

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses-5.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

5.04 Principles of Inorganic Chemistry II (MIT) 5.04 Principles of Inorganic Chemistry II (MIT)

Description

This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. Against the backdrop of electronic structure, the electronic, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy described. This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. Against the backdrop of electronic structure, the electronic, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy described.

Subjects

inorganic chemistry | inorganic chemistry | group theory | group theory | electronic structure of molecules | electronic structure of molecules | transition metal complexes | transition metal complexes | spectroscopy | spectroscopy | symmetry elements | symmetry elements | mathematical groups | mathematical groups | character tables | character tables | molecular point groups | molecular point groups | Huckel Theory | Huckel Theory | N-Dimensional cyclic systems | N-Dimensional cyclic systems | solid state theory | solid state theory | band theory | band theory | frontier molecular orbitals | frontier molecular orbitals | similarity transformations | similarity transformations | complexes | complexes | organometallic complexes | organometallic complexes | two electron bond | two electron bond | vibrational spectroscopy | vibrational spectroscopy | symmetry | symmetry | overtones | overtones | normal coordinat analysis | normal coordinat analysis | AOM | AOM | single electron CFT | single electron CFT | tanabe-sugano diagram | tanabe-sugano diagram | ligand | ligand | crystal field theory | crystal field theory | LCAO | LCAO

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.720J Integrated Microelectronic Devices (MIT) 6.720J Integrated Microelectronic Devices (MIT)

Description

6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. 6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points.

Subjects

integrated microelectronic devices | integrated microelectronic devices | physics | physics | silicon | silicon | circuit | circuit | semiconductor | semiconductor | p-n junction | p-n junction | metal-oxide semiconductor structure | metal-oxide semiconductor structure | metal-semiconductor junction | metal-semiconductor junction | MOS field-effect transistor | MOS field-effect transistor | bipolar junction transistor | bipolar junction transistor | energy band diagram | energy band diagram | short-channel MOSFET | short-channel MOSFET | device characterization | device characterization | device design | device design | 6.720 | 6.720 | 3.43 | 3.43

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

8.511 Theory of Solids I (MIT) 8.511 Theory of Solids I (MIT)

Description

This is the first term of a theoretical treatment of the physics of solids. Topics covered include crystal structure and band theory, density functional theory, a survey of properties of metals and semiconductors, quantum Hall effect, phonons, electron phonon interaction and superconductivity. This is the first term of a theoretical treatment of the physics of solids. Topics covered include crystal structure and band theory, density functional theory, a survey of properties of metals and semiconductors, quantum Hall effect, phonons, electron phonon interaction and superconductivity.

Subjects

physics of solids | physics of solids | elementary excitations | elementary excitations | symmetry | symmetry | theory of representations | theory of representations | energy bands | energy bands | excitons | excitons | critical points | critical points | response functions | response functions | interactions in the electron gas | interactions in the electron gas | electronic structure of metals | semimetals | electronic structure of metals | semimetals | semiconductors | semiconductors | insulators | insulators | Free electron model | Free electron model | Crystalline lattice | Crystalline lattice | Debye Waller factor | Debye Waller factor | Bravais lattice | Bravais lattice | Pseudopotential | Pseudopotential | van Hove singularity | van Hove singularity | Bloch oscillation | Bloch oscillation | quantization of orbits | quantization of orbits | de Haas-van Alphen effect | de Haas-van Alphen effect | Quantum Hall effect | Quantum Hall effect | Electron-electron interaction | Electron-electron interaction | Hartree-Fock approximation | Hartree-Fock approximation | Exchange energy for Jellium | Exchange energy for Jellium | Density functional theory | Density functional theory | Hubbard model | Hubbard model | Electron-phonon coupling | Electron-phonon coupling | phonons | phonons

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

TALAT Lecture 1202: Metallography of Aluminium Alloys TALAT Lecture 1202: Metallography of Aluminium Alloys

Description

This lecture aims at providing a survey of the metallographic techniques available for the examination of aluminium and its alloys. The information must be sufficient to be sure that the students and the users are able to choose the most suitable technique to solve their problems in the examination of samples. The lecture should contain a direct understanding of the main problems in the metallography of the different classes of aluminium materials. This lecture aims at providing a survey of the metallographic techniques available for the examination of aluminium and its alloys. The information must be sufficient to be sure that the students and the users are able to choose the most suitable technique to solve their problems in the examination of samples. The lecture should contain a direct understanding of the main problems in the metallography of the different classes of aluminium materials.

Subjects

aluminium | aluminium | aluminum | aluminum | european aluminium association | european aluminium association | EAA | EAA | Training in Aluminium Application Technologies | Training in Aluminium Application Technologies | training | training | metallurgy | metallurgy | technology | technology | lecture | lecture | metallography | metallography | sample preparation | sample preparation | grinding | grinding | polishing | polishing | etching | etching | anodising | anodising | electropolishing | electropolishing | dimpling | dimpling | ion milling | ion milling | polarised light | polarised light | electron channelling | electron channelling | interference contrast | interference contrast | high resolution electron microscopy | high resolution electron microscopy | SEM | SEM | TEM | TEM | HREM | HREM | HVEM | HVEM | optical microscopy | optical microscopy | high voltage electron microscopy | high voltage electron microscopy | commercial purity | commercial purity | wrought alloys | wrought alloys | foundry alloys | foundry alloys | corematerials | corematerials | ukoer | ukoer

License

http://creativecommons.org/licenses/by-nc-sa/2.0/uk/

Site sourced from

http://core.materials.ac.uk/rss/talat.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

TALAT Lecture 1253: Creep TALAT Lecture 1253: Creep

Description

This lecture constitutes an introduction to creep and to the creep response of aluminium and its alloys. It provides basic information on creep and its mechanisms; it gives a description of the more extensively used mathematical relations among creep variables (time, stress and temperature); it illustrates the creep response of pure Aluminium and of Al-Mg alloys; it provides a synthesis of the information available in the literature on the creep behaviour of a number of new alloys and composites in the form of a series of figures elaborated on the basis of the data reported in same sources. Basic knowledge of physics and chemistry and some familiarity with TALAT lectures 1201 through 1205 is assumed. This lecture constitutes an introduction to creep and to the creep response of aluminium and its alloys. It provides basic information on creep and its mechanisms; it gives a description of the more extensively used mathematical relations among creep variables (time, stress and temperature); it illustrates the creep response of pure Aluminium and of Al-Mg alloys; it provides a synthesis of the information available in the literature on the creep behaviour of a number of new alloys and composites in the form of a series of figures elaborated on the basis of the data reported in same sources. Basic knowledge of physics and chemistry and some familiarity with TALAT lectures 1201 through 1205 is assumed.

Subjects

aluminium | aluminium | aluminum | aluminum | european aluminium association | european aluminium association | EAA | EAA | Training in Aluminium Application Technologies | Training in Aluminium Application Technologies | training | training | metallurgy | metallurgy | technology | technology | lecture | lecture | creep | creep | creep curve | creep curve | creep rate | creep rate | diffusion | diffusion | time to rupture | time to rupture | pure metals | pure metals | solid solutions | solid solutions | creep strength | creep strength | creep rupture | creep rupture | creep response | creep response | creep-resistant | creep-resistant | composite | composite | dispersion-strengthened | dispersion-strengthened | high strength alloys | high strength alloys | corematerials | corematerials | ukoer | ukoer

License

http://creativecommons.org/licenses/by-nc-sa/2.0/uk/

Site sourced from

http://core.materials.ac.uk/rss/talat.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

TALAT Lecture 1255: Metallurgical Background to Alloy Selection and Specifications for Wrought, Cast and Special Applications TALAT Lecture 1255: Metallurgical Background to Alloy Selection and Specifications for Wrought, Cast and Special Applications

Description

This lecture outlines the metallurgical principles of alloy selection and specifications. Basic knowledge of physics and chemistry and some familiarity with TALAT lectures 1201 through 1205 is assumed. This lecture outlines the metallurgical principles of alloy selection and specifications. Basic knowledge of physics and chemistry and some familiarity with TALAT lectures 1201 through 1205 is assumed.

Subjects

aluminium | aluminium | aluminum | aluminum | european aluminium association | european aluminium association | EAA | EAA | Training in Aluminium Application Technologies | Training in Aluminium Application Technologies | training | training | metallurgy | metallurgy | technology | technology | lecture | lecture | alloy selection | alloy selection | wrought alloys | wrought alloys | cast alloys | cast alloys | aerospace alloys | aerospace alloys | hot isostatic processing | hot isostatic processing | particulate processing | particulate processing | rapid solidification processing | rapid solidification processing | particulate metal matrix composites | particulate metal matrix composites | Al-Li based alloys | Al-Li based alloys | corematerials | corematerials | ukoer | ukoer

License

http://creativecommons.org/licenses/by-nc-sa/2.0/uk/

Site sourced from

http://core.materials.ac.uk/rss/talat.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

5.04 Principles of Inorganic Chemistry II (MIT) 5.04 Principles of Inorganic Chemistry II (MIT)

Description

This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. Against the backdrop of electronic structure, the electronic, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy described. This course provides a systematic presentation of the chemical applications of group theory with emphasis on the formal development of the subject and its applications to the physical methods of inorganic chemical compounds. Against the backdrop of electronic structure, the electronic, vibrational, and magnetic properties of transition metal complexes are presented and their investigation by the appropriate spectroscopy described.

Subjects

inorganic chemistry | inorganic chemistry | group theory | group theory | electronic structure of molecules | electronic structure of molecules | transition metal complexes | transition metal complexes | spectroscopy | spectroscopy | symmetry elements | symmetry elements | mathematical groups | mathematical groups | character tables | character tables | molecular point groups | molecular point groups | Huckel Theory | Huckel Theory | N-Dimensional cyclic systems | N-Dimensional cyclic systems | solid state theory | solid state theory | band theory | band theory | frontier molecular orbitals | frontier molecular orbitals | similarity transformations | similarity transformations | complexes | complexes | organometallic complexes | organometallic complexes | two electron bond | two electron bond | vibrational spectroscopy | vibrational spectroscopy | symmetry | symmetry | overtones | overtones | normal coordinat analysis | normal coordinat analysis | AOM | AOM | single electron CFT | single electron CFT | tanabe-sugano diagram | tanabe-sugano diagram | ligand | ligand | crystal field theory | crystal field theory | LCAO | LCAO

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allsimplifiedchinesecourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.720J Integrated Microelectronic Devices (MIT) 6.720J Integrated Microelectronic Devices (MIT)

Description

6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. Acknowledgments Prof. Jesús del Alamo would like to thank Prof. Harry Tuller for his support of and help in teaching the course. 6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. Acknowledgments Prof. Jesús del Alamo would like to thank Prof. Harry Tuller for his support of and help in teaching the course.

Subjects

integrated microelectronic devices | integrated microelectronic devices | physics | physics | silicon | silicon | circuit | circuit | semiconductor | semiconductor | p-n junction | p-n junction | metal-oxide semiconductor structure | metal-oxide semiconductor structure | metal-semiconductor junction | metal-semiconductor junction | MOS field-effect transistor | MOS field-effect transistor | bipolar junction transistor | bipolar junction transistor | energy band diagram | energy band diagram | short-channel MOSFET | short-channel MOSFET | device characterization | device characterization | device design | device design

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allsimplifiedchinesecourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.772 Compound Semiconductor Devices (MIT) 6.772 Compound Semiconductor Devices (MIT)

Description

This course outlines the physics, modeling, application, and technology of compound semiconductors (primarily III-Vs) in electronic, optoelectronic, and photonic devices and integrated circuits. Topics include: properties, preparation, and processing of compound semiconductors; theory and practice of heterojunctions, quantum structures, and pseudomorphic strained layers; metal-semiconductor field effect transistors (MESFETs); heterojunction field effect transistors (HFETs) and bipolar transistors (HBTs); photodiodes, vertical-and in-plane-cavity laser diodes, and other optoelectronic devices. This course outlines the physics, modeling, application, and technology of compound semiconductors (primarily III-Vs) in electronic, optoelectronic, and photonic devices and integrated circuits. Topics include: properties, preparation, and processing of compound semiconductors; theory and practice of heterojunctions, quantum structures, and pseudomorphic strained layers; metal-semiconductor field effect transistors (MESFETs); heterojunction field effect transistors (HFETs) and bipolar transistors (HBTs); photodiodes, vertical-and in-plane-cavity laser diodes, and other optoelectronic devices.

Subjects

physics | physics | modeling | modeling | application | application | technology of compound semiconductors | technology of compound semiconductors | electronic | electronic | optoelectronic | optoelectronic | photonic devices | photonic devices | integrated circuits | integrated circuits | properties | properties | heterojunctions | heterojunctions | quantum structures | quantum structures | pseudomorphic strained layers | pseudomorphic strained layers | metal-semiconductor field effect transistors (MESFETs) | metal-semiconductor field effect transistors (MESFETs) | heterojunction field effect transistors (HFETs) | heterojunction field effect transistors (HFETs) | bipolar transistors (HBTs) | bipolar transistors (HBTs) | photodiodes | photodiodes | laser diodes | laser diodes | optoelectronic devices | optoelectronic devices | applications | applications | compound semiconductors | compound semiconductors | electronic devices | electronic devices | compound semiconductor processing | compound semiconductor processing | metal-semiconductor field effect transistors | metal-semiconductor field effect transistors | MESFET | MESFET | heterojunction field effect transistors | heterojunction field effect transistors | HFET | HFET | bipolar transistors | bipolar transistors | HBT | HBT | vertical-cavity laser diodes | vertical-cavity laser diodes | in-plane-cavity laser diodes | in-plane-cavity laser diodes

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

3.051J Materials for Biomedical Applications (MIT) 3.051J Materials for Biomedical Applications (MIT)

Description

This course gives an introduction to the interactions between proteins, cells and surfaces of biomaterials. It includes surface chemistry and physics of selected metals, polymers and ceramics, modification of biomaterials surfaces, and surface characterization methodology; quantitative assays of cell behavior in culture and methods of statistical analysis; organ replacement therapies and acute and chronic response to implanted biomaterials. The course includes topics in biosensors, drug delivery and tissue engineering. This course gives an introduction to the interactions between proteins, cells and surfaces of biomaterials. It includes surface chemistry and physics of selected metals, polymers and ceramics, modification of biomaterials surfaces, and surface characterization methodology; quantitative assays of cell behavior in culture and methods of statistical analysis; organ replacement therapies and acute and chronic response to implanted biomaterials. The course includes topics in biosensors, drug delivery and tissue engineering.

Subjects

Interactions between proteins | Interactions between proteins | cells | cells | Surface chemistry and physics of metals | Surface chemistry and physics of metals | polymers and ceramics | polymers and ceramics | Surface characterization methodology | Surface characterization methodology | Quantitative assays of cell behavior | Quantitative assays of cell behavior | Organ replacement therapies | Organ replacement therapies | Acute and chronic response to implanted biomaterials | Acute and chronic response to implanted biomaterials | Biosensors | Biosensors | drug delivery and tissue engineering | drug delivery and tissue engineering | Interactions between proteins | cells | Interactions between proteins | cells | Surface chemistry and physics of metals | polymers and ceramics | Surface chemistry and physics of metals | polymers and ceramics | Biosensors | drug delivery and tissue engineering | Biosensors | drug delivery and tissue engineering | BE.340J | BE.340J | 3.051 | 3.051 | BE.340 | BE.340 | 20.340 | 20.340

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allarchivedcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.720J Integrated Microelectronic Devices (MIT) 6.720J Integrated Microelectronic Devices (MIT)

Description

6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. Acknowledgments Prof. Jesús del Alamo would like to thank Prof. Harry Tuller for his support of and help in teaching the course. 6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. Acknowledgments Prof. Jesús del Alamo would like to thank Prof. Harry Tuller for his support of and help in teaching the course.

Subjects

integrated microelectronic devices | integrated microelectronic devices | physics | physics | silicon | silicon | circuit | circuit | semiconductor | semiconductor | p-n junction | p-n junction | metal-oxide semiconductor structure | metal-oxide semiconductor structure | metal-semiconductor junction | metal-semiconductor junction | MOS field-effect transistor | MOS field-effect transistor | bipolar junction transistor | bipolar junction transistor | energy band diagram | energy band diagram | short-channel MOSFET | short-channel MOSFET | device characterization | device characterization | device design | device design

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses-6.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.772 Compound Semiconductor Devices (MIT) 6.772 Compound Semiconductor Devices (MIT)

Description

This course outlines the physics, modeling, application, and technology of compound semiconductors (primarily III-Vs) in electronic, optoelectronic, and photonic devices and integrated circuits. Topics include: properties, preparation, and processing of compound semiconductors; theory and practice of heterojunctions, quantum structures, and pseudomorphic strained layers; metal-semiconductor field effect transistors (MESFETs); heterojunction field effect transistors (HFETs) and bipolar transistors (HBTs); photodiodes, vertical-and in-plane-cavity laser diodes, and other optoelectronic devices. This course outlines the physics, modeling, application, and technology of compound semiconductors (primarily III-Vs) in electronic, optoelectronic, and photonic devices and integrated circuits. Topics include: properties, preparation, and processing of compound semiconductors; theory and practice of heterojunctions, quantum structures, and pseudomorphic strained layers; metal-semiconductor field effect transistors (MESFETs); heterojunction field effect transistors (HFETs) and bipolar transistors (HBTs); photodiodes, vertical-and in-plane-cavity laser diodes, and other optoelectronic devices.

Subjects

physics | physics | modeling | modeling | application | application | technology of compound semiconductors | technology of compound semiconductors | electronic | electronic | optoelectronic | optoelectronic | photonic devices | photonic devices | integrated circuits | integrated circuits | properties | properties | heterojunctions | heterojunctions | quantum structures | quantum structures | pseudomorphic strained layers | pseudomorphic strained layers | metal-semiconductor field effect transistors (MESFETs) | metal-semiconductor field effect transistors (MESFETs) | heterojunction field effect transistors (HFETs) | heterojunction field effect transistors (HFETs) | bipolar transistors (HBTs) | bipolar transistors (HBTs) | photodiodes | photodiodes | laser diodes | laser diodes | optoelectronic devices | optoelectronic devices | applications | applications | compound semiconductors | compound semiconductors | electronic devices | electronic devices | compound semiconductor processing | compound semiconductor processing | metal-semiconductor field effect transistors | metal-semiconductor field effect transistors | MESFET | MESFET | heterojunction field effect transistors | heterojunction field effect transistors | HFET | HFET | bipolar transistors | bipolar transistors | HBT | HBT | vertical-cavity laser diodes | vertical-cavity laser diodes | in-plane-cavity laser diodes | in-plane-cavity laser diodes

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allsimplifiedchinesecourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata

6.720J Integrated Microelectronic Devices (MIT) 6.720J Integrated Microelectronic Devices (MIT)

Description

6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. Acknowledgments Prof. Jesús del Alamo would like to thank Prof. Harry Tuller for his support of and help in teaching the course. 6.720 examines the physics of microelectronic semiconductor devices for silicon integrated circuit applications. Topics covered include: semiconductor fundamentals, p-n junction, metal-oxide semiconductor structure, metal-semiconductor junction, MOS field-effect transistor, and bipolar junction transistor. The course emphasizes physical understanding of device operation through energy band diagrams and short-channel MOSFET device design. Issues in modern device scaling are also outlined. The course is worth 2 Engineering Design Points. Acknowledgments Prof. Jesús del Alamo would like to thank Prof. Harry Tuller for his support of and help in teaching the course.

Subjects

integrated microelectronic devices | integrated microelectronic devices | physics | physics | silicon | silicon | circuit | circuit | semiconductor | semiconductor | p-n junction | p-n junction | metal-oxide semiconductor structure | metal-oxide semiconductor structure | metal-semiconductor junction | metal-semiconductor junction | MOS field-effect transistor | MOS field-effect transistor | bipolar junction transistor | bipolar junction transistor | energy band diagram | energy band diagram | short-channel MOSFET | short-channel MOSFET | device characterization | device characterization | device design | device design

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allcourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata