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6.152J Microelectronics Processing Technology (MIT) 6.152J Microelectronics Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | microelectronics | Microelectronics processing | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits | integrated circuits | vacuum | vacuum | chemical vapor deposition | chemical vapor deposition | CVD | CVD | oxidation | oxidation | diffusion | diffusion | implantation | implantation | lithography | lithography | soft lithography | soft lithography | etching | etching | sputtering | sputtering | evaporation | evaporation | interconnect | interconnect | metallization | metallization | crystal growth | crystal growth | reliability | reliability | fabrication | fabrication | processing | processing | photolithography | photolithography | physical vapor deposition | physical vapor deposition | MOS | MOS | MOS capacitor | MOS capacitor | microcantilever | microcantilever | microfluidic | microfluidic | 6.152 | 6.152 | 3.155 | 3.155

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Microelectronics Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | integrated circuits;vacuum;chemical vapor deposition;CVD;oxidation;diffusion;implantation;lithography;soft lithography;etching;sputtering;evaporation;interconnect;metallization;crystal growth;reliability;fabrication;processing;photolithography;physical vapor deposition;MOS;MOS capacitor;microcantilever;microfluidic | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic | 6.152 | 3.155

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT) 6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology. This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | microelectronics | Microelectronics processing | Microelectronics processing | integrated circuits | integrated circuits | vacuum | vacuum | chemical vapor deposition | chemical vapor deposition | CVD | CVD | oxidation | oxidation | diffusion | diffusion | implantation | implantation | lithography | lithography | soft lithography | soft lithography | etching | etching | sputtering | sputtering | evaporation | evaporation | interconnect | interconnect | metallization | metallization | crystal growth | crystal growth | reliability | reliability | fabrication | fabrication | processing | processing | photolithography | photolithography | physical vapor deposition | physical vapor deposition | MOS | MOS | MOS capacitor | MOS capacitor | microcantilever | microcantilever | microfluidic. | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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Direct-current (DC) magnetron sputtering system

Description

This resource is a video for the use of experimental equipment: DC magnetron sputtering. Magnetron sputtering is an extremely flexible coating technique that can be used to coat virtually any material. Sputtering is basically the removal of atomised material from a solid by energetic bombardment of its surface layers by ions or neutral particles. Magnetron sputtering can be done either in DC or RF modes. DC sputtering is done with conducting materials. If the target is a non conducting material the positive charge will build up on the material and it will stop sputtering. The resourse covers substrate preparation (generic) and demonstration how to use the equipment.

Subjects

thin film | coating | experimental equipment | substrate preparation | deposition | magnetron sputtering | video | corematerials | ukoer | Engineering | H000

License

Attribution 2.0 UK: England & Wales Attribution 2.0 UK: England & Wales http://creativecommons.org/licenses/by/2.0/uk/ http://creativecommons.org/licenses/by/2.0/uk/

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see http://ocw.mit.edu/terms/index.htm

Site sourced from

http://ocw.mit.edu/rss/all/mit-allthaicourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

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6.152J Micro/Nano Processing Technology (MIT)

Description

This course introduces the theory and technology of micro/nano fabrication. Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. Through team lab assignments, students are expected to gain an understanding of these processing techniques, and how they are applied in concert to device fabrication. Students enrolled in this course have a unique opportunity to fashion and test micro/nano-devices, using modern techniques and technology.

Subjects

microelectronics | Microelectronics processing | integrated circuits | vacuum | chemical vapor deposition | CVD | oxidation | diffusion | implantation | lithography | soft lithography | etching | sputtering | evaporation | interconnect | metallization | crystal growth | reliability | fabrication | processing | photolithography | physical vapor deposition | MOS | MOS capacitor | microcantilever | microfluidic.

License

Content within individual OCW courses is (c) by the individual authors unless otherwise noted. MIT OpenCourseWare materials are licensed by the Massachusetts Institute of Technology under a Creative Commons License (Attribution-NonCommercial-ShareAlike). For further information see https://ocw.mit.edu/terms/index.htm

Site sourced from

https://ocw.mit.edu/rss/all/mit-alllifesciencescourses.xml

Attribution

Click to get HTML | Click to get attribution | Click to get URL

All metadata

See all metadata